Thin-film transistor and method of making same

ABSTRACT

A thin-film transistor includes a substrate, and a gate including a double-layered structure having first and second metal layers provided on the substrate, the first metal layer being wider than the second metal layer by 1 to 4 μm. A method of making such a thin-film transistor includes the steps of: depositing a first metal layer on a substrate, depositing a second metal layers directly on the first metal layer; forming a photoresist having a designated width on the second metal layer; patterning the second metal layer via isotropic etching using the photoresist as a mask; patterning the first metal layer by means of an anisotropic etching using the photoresist as a mask, the first metal layer being etched to have the designated width, thus forming a gate having a laminated structure of the first and second metal layers; and removing the photoresist.

This application is a divisional of application Ser. No. 10/154,955,filed on May 28, 2002, now U.S. Pat. No. 6,548,829 which is acontinuation of abandoned application Ser. No. 09/940,504, filed on Aug.29, 2001, which is a divisional application under 37 C.F.R. §1.53(b) ofpatented prior application Ser. No. 09/243,556 (U.S. Pat. No. 6,340,610B1) filed on Feb. 2, 1999 (Issued on Jan. 22, 2002):, which isdivisional application under 37 C.F.R. §1.53(b) of patented priorapplication Ser. No. 08/918,119 (U.S. Pat. No. 5,905,274) filed on Aug.27, 1997 (Issued on May 18, 1999) the entire contents of which arehereby incorporated by reference and for which priority is claimed under35 U.S.C. §120; and this application claims priority of Application No.97-07010 filed in Korea on Mar. 4, 1997 under 35 U.S.C. §119.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a thin-film transistor of a liquidcrystal display and, more particularly, to a thin-film transistor havinga gate including a double-layered metal structure and a method of makingsuch a double-layered metal gate.

2. Discussion of Related Art

An LCD (Liquid Crystal Display) includes a switching device as a drivingelement, and a pixel-arranged matrix structure having transparent orlight-reflecting pixel electrodes as its basic units. The switchingdevice is a thin-film transistor having gate, source and drain regions.

The gate of the thin-film transistor is made of aluminum to reduce itswiring resistance, but an aluminum gate may cause defects such ashillock.

A double-layered metal gate, i.e., molybdenum-coated aluminum gate isconsidered as a substitute for the aluminum gate to overcome the problemof the hillock.

To fabricate a double-layered gate, metals such as aluminum andmolybdenum are sequentially deposited, followed by a patterning processcarried out via photolithography to form resulting metal films whichhave the same width. Although the double-layered gate is desirable toovercome the problem of hillock, the resulting deposited metal filmsforming the double-layered gate are so thick that a severe single stepis created by a thickness difference between the metal films and asubstrate, thereby causing a single step difference between thesubstrate and the double-layered gate which deteriorates the stepcoverage of a later formed gate oxide layer. The source and drainregions formed on the gate oxide layer may have disconnections betweenareas of the source and drain regions which are overlapped andnon-overlapped with the gate, or electrically exhibit short circuits asa result of contact with the gate.

According to another method of forming the gate, each of the metallayers of Al and Mo form a double step difference with the substrate soas to improve the step coverage of the gate oxide layer.

FIGS. 1A through 1F are diagrams illustrating the process forfabricating a thin-film transistor of a method which is related to theinvention described and claimed in the present application. The methodshown in FIGS. 1A-1F is not believed to be published prior art but ismerely a recently discovered method related to the invention describedand claimed in the present application.

Referring to FIG. 1A, aluminum is deposited on a substrate 11 to form afirst metal layer 13. A first photoresist 15 is deposited on the firstmetal layer 13. The first photoresist 15 is exposed and developed so asto have a certain width w1 extending along the first metal layer 13.

Referring to FIG. 1B, the first metal layer 13 is patterned via wetetching using the first photoresist 15 as a mask so that the first metallayer 13 has a certain width w1. After the first photoresist 15 isremoved, a second metal layer 17 is formed by depositing Mo, Ta, or Coon the substrate 11 so as to cover the first metal layer 13. A secondphotoresist 19 is then deposited on the second metal layer 17. Thesecond photoresist 19 is exposed and developed so as to have a certainwidth w2 extending along the second metal layer 17 and located above thefirst metal layer 13.

Referring to FIG. 1C, the second metal layer 17 is patterned via a wetetching process using the second photoresist 19 as a mask such that thesecond metal layer 17 has a certain width w2 which is narrower than thewidth w1 of the first metal layer 13. After formation of the gate 21,the second photoresist 19 is removed.

Thus, the patterned first and second metal layers 13 and 17 form a gate21 having a double-layered metal structure that provides double stepdifference between the double-layered metal gate structure 21 and thesubstrate 11. The formation of the gate 21 as described above and shownin FIGS. 1A-1F requires the use of two photoresists 15, 19 and twophotoresist steps.

In the gate 21, shown in FIG. 1C, the second metal layer 17 ispreferably centrally located on the first metal layer 13. Although thereis no specific information available regarding a relationship of w1 tow2 of this related art method, based on their understanding of thisrelated method resulting in the structure shown in FIG. 1C, theinventors of the invention described and claimed in the presentapplication assume that the width difference w1−w2 between the first andsecond metal layers 13 and 17 is larger than or equal to 4 μm, that is,w1−w2≧4 μm.

Referring to FIG. 1D, a first insulating layer 23 is formed bydepositing silicon oxide SiO₂ or silicon nitride Si₃N₄ as asingle-layered or double-layered structure on the gate 21 and substrate11. Semiconductor and ohmic contact layers 25 and 27 are formed bysequentially depositing undoped polycrystalline silicon and heavilydoped silicon on the first insulating layer 23. The semiconductor andohmic contact layers 25 and 27 are patterned to expose the firstinsulating layer 23 by photolithography.

Referring to FIG. 1E, conductive metal such as aluminum is laminated onthe insulating and ohmic contact layers 23 and 27. The conductive metalis patterned by photolithography so as to form source electrode 29 and adrain electrode 31. A portion of the ohmic contact layer 27 exposedbetween the source and drain electrodes 29 and 31 is etched by using thesource and drain electrodes 29 and 31 as masks.

Referring to FIG. 1F, silicon oxide or silicon nitride is deposited onthe entire surface of the structure to form a second insulating layer33. The second insulating layer 33 is etched to expose a designatedportion of the drain electrode 31, thus forming a contact hole 35. Bydepositing transparent and conductive material on the second insulatinglayer 33 and patterning it via photolithography, a pixel electrode 37 isformed so as to be electrically connected to the drain electrode 31through the contact hole 35.

According to the method of fabricating a thin-film transistor asdescribed above and shown in FIGS. 1A-1F, respective first and secondmetal layers are formed through photolithography using different masksso as to form the gate with a double-layered metal structure, resultingin double step differences between the gate and substrate.

As a result of the double step difference between the gate 21 and thesubstrate 11 shown in FIG. 1C, a hillock often occurs on both sideportions of the first metal layer 13 which have no portion of the secondmetal layer 17 deposited thereon when the first metal layer 13 is widerthan the second metal layer 17 as in FIG. 1C. Another problem with thisrelated art method is that the process for forming a gate is complex andrequires two photoresists 15, 19 and two steps of deposition andphotolithography. As a result, the contact resistance between the firstand second metal layers may be increased.

Another related art method of forming a double metal layer gatestructure is described in “Low Cost, High Quality TFT-LCD Process”,SOCIETY FOR INFORMATION DISPLAY EURO DISPLAY 96, Proceedings of the16^(th) International Display Research Conference, Birmingham, England,Oct. 1, 1996, pages 591-594. One page 592 of this publication, a methodof forming a double metal gate structure includes the process ofdepositing two metal layers first and then patterning the two metallayer to thereby eliminate an additional photoresist step. However, withthis method, process difficulties during the one step photoresistprocess for forming the double metal layer gate resulted in the toplayer being wider than the bottom layer causing an overhang condition inwhich the top layer overhangs the bottom layer. This difficulty mayresult in poor step coverage and disconnection. This problem was solvedby using a three-step etching process in which the photoresist had to bebaked before each of the three etching steps to avoid lift-off orremoval of the photoresist during etching. This three-step etchingprocess and required baking of the photoresist significantly increasesthe complexity and steps of the gate forming method.

SUMMARY OF THE INVENTION

To overcome the problems discussed above, the preferred embodiments ofthe present invention provide a thin-film transistor which prevents ahillock and deterioration of step coverage of a later formed gate oxidelayer on a double metal layer gate.

The preferred embodiments of the present invention also provide a methodof fabricating a thin-film transistor that simplifies the process forforming a double metal layer gate.

The preferred embodiments of the present invention further provide amethod of fabricating a thin-film transistor that reduces the contactresistance between the first and second metal layers constituting agate.

Additional features and advantages of the invention will be set forth inthe description which follows, and in part will be apparent from thedescription, or may be learned by practice of the invention. Theobjectives and other advantages of the invention will be realized andattained by the structure particularly pointed out in the writtendescription and claims hereof, as well as, the appended drawings.

To achieve these and other advantages and in accordance with the purposeof the preferred embodiments of the present invention, as embodied andbroadly described, a thin-film transistor preferably comprises asubstrate, and a gate including a double-layered structure of first andsecond metal layers disposed on the substrate, the first metal layerbeing wider than the second metal layer by about 1 to 4 μm, and a methodof making such a thin-film transistor preferably comprises the steps of:depositing a first metal layer on a substrate, depositing a second metallayer directly on the first metal layer; forming a photoresist having adesired width on the second metal layer; patterning the second metallayer via an isotropic etching using the photoresist as a mask;patterning the first metal layer via an anisotropic etching using thephotoresist as a mask, the first metal layer being etched to have adesired width, thus forming a gate having a laminated structure of thefirst and second layers; and removing the photoresist.

These and other elements, features, and advantages of the preferredembodiments of the present invention will be apparent from the followingdetailed description of the preferred embodiments of the presentinvention, as illustrated in the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate preferred embodiments of theinvention and together with the description serve to explain theprinciples of the invention, in which:

FIGS. 1A through 1F are diagrams illustrating a process for fabricatinga thin-film transistor according to a method of the related art;

FIG. 2 is a top view of a thin-film transistor according to a preferredembodiment of the present invention;

FIG. 3 is a cross-sectional view taken along line III-III of FIG. 2; and

FIGS. 4A through 4F are diagrams illustrating a process for fabricatinga thin-film transistor of preferred embodiments of the presentinvention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

Reference will now be made in detail to preferred embodiments of thepresent invention, examples of which are illustrated in the accompanyingdrawings.

FIG. 2 is a top view of a thin-film transistor according to a preferredembodiment of the present invention. FIG. 3 is a cross-sectional viewtaken along line III-III of FIG. 2.

The thin-film transistor comprises a gate 49 having a double-layeredstructure of a first metal layer 43, a second metal layer 45 disposed ona substrate 41, a first insulating layer 51, a second insulating layers61, a semiconductor layer 53, an ohmic contact layer 55, a sourceelectrode 57, a drain electrode 59, and a pixel electrode 65.

The gate 49 has a double-layered structure including the first andsecond metal layers 43 and 45 disposed on the substrate 41. The firstmetal layer 43 is preferably formed from a conductive metal such as Al,Cu, or Au deposited to have a certain width w1. The second metal layer45 is preferably formed from a refractory metal such as Mo, Ta, or Codeposited to have a certain width w2.

The present inventors have discovered that a relationship between thewidth of the first metal layer and the width of the second metal layerof a double metal layer gate electrode is critical to preventingdeterioration of step coverage of a later formed gate oxide layer insuch a structure having a double step difference between the substrateand the gate. More specifically, the present inventors determined that astructure wherein the first metal layer 43 is wider than the secondmetal layer 45 by about 1 to 4 μm, for example, 1 μm<w1−w2<4 μm,provides maximum prevention of deterioration of step coverage of a laterformed gate oxide layer in such a structure having a double stepdifference between the substrate and the gate.

To achieve the best results, the second metal layer 45 is preferablypositioned substantially in the middle of the first metal layer 45, sothat both side portions of the first metal layer 43 which have noportion of the second metal layer 45 disposed thereon have substantiallythe same width as each other. The width of each of the side portions ispreferably larger than about 0.5 μm but less than about 2 μm.

The first insulating layer 51 is preferably formed by depositing singlelayer of silicon oxide SiO₂ or silicon nitride Si₃N₄ on the substrateincluding the gate 49.

The semiconductor and ohmic contact layers 53 and 55 are formed on theportion of the first insulating layer 51 corresponding to the gate 49 bysequentially depositing undoped amorphous silicon and heavily dopedamorphous silicon and patterning the two silicon layers. Thesemiconductor layer 53 is used as the active region of an element, thusforming a channel by means of a voltage applied to the gate 49. Theohmic contact layer 55 provides an ohmic contact between thesemiconductor layer 53 and the source and drain electrodes 57 and 59.The ohmic contact layer 55 is not formed in the portion that becomes thechannel of the semiconductor layer 53.

The source and drain electrodes 57 and 59 are in contact with the ohmiccontact layer 55, and each electrode 57, 59 extends to a designatedportion on the first insulating layer 51.

The second insulating layer 61 is formed by depositing insulatingmaterial such as silicon oxide SiO₂ silicon nitride Si₃N₄ to cover thesource and drain electrodes 57 and 59 and the first insulating layer 51.The second insulating layer 61 on the drain electrode 59 is removed toform a contact hole 63. The pixel electrode 65 is formed fromtransparent and conductive material such as ITO (Indium Tin Oxide) orTin oxide SnO₂, so that it is connected to the drain electrode 59through the contact hole 63.

In the first and second metal layers 43 and 45 constituting the gate 49,each side portion of the first metal layer 43 having no portion of thesecond metal layer 45 thereon has a width that is preferably larger thanabout 0.5 μm and less than about 2 μm. Because the first metal layer 43is wider than the second metal layer 45 by about 1.0 μm to 4.0 μm,double step differences determined according to the relationship betweenthe width of the first metal layer and the width of the second metallayer are formed between the gate 49 and substrate 41. The double stepdifferences determined according to the novel features of the preferredembodiments of the present invention prevent deterioration of thecoverage of the first insulating layer 51 which deterioration occurs inprior art devices. The hillock in the first metal layer 43 is alsoavoidable because the width difference between the first and secondmetal layers 43 and 45 is between about 1 μm to 4 μm.

FIGS. 4A through 4F are diagrams illustrating the process forfabricating the thin-film transistor of the preferred embodiments of thepresent invention.

Referring to FIG. 4A, metal such as Al, Cu, or Au is deposited on asubstrate so as to form a first metal layer 43. A second metal layer 45is formed from Mo, Ta, or Co and deposited on the first metal layer 43without performing a masking step between the step of depositing thefirst metal layer and the step of depositing the second metal layer. Thefirst and second metal layers 43 and 45 are sequentially deposited so asto preferably have a thickness as large as about 500-4000 Angstroms and500-2000 Angstroms, respectively, by means of sputtering or chemicalvapor deposition (hereinafter, referred to as CVD) without breaking avacuum state. As a result, the contact resistance between the first andsecond metal layers 43 and 45 is reduced.

According to the preferred embodiments of the present invention, asingle photoresist step is used to pattern both the first metal layer 43and the second metal layer 45 simultaneously. In the single photoresiststep, a photoresist 47 is deposited on the second metal layer 45 andthen the photoresist 47 is patterned through exposure and development tohave the width w1 on a designated portion of the second metal layer 45.

Referring to FIG. 4B, the second metal layer 45 is patterned with anetching solution preferably prepared with a mixture of phosphoric acidH₃PO₄, acetic acid CH₃COOH and nitric acid HNO₃, by means of a wetetching using the photoresist 47 as a mask. Because the portion of thesecond metal layer 45 covered with the photoresist 47, as well as,exposed side portions of the second metal layer 45 are isotropicallyetched, the second metal layer 45 is preferably patterned to have thewidth w2 which is narrower than the width w1 of the photoresist 47 whichis the same as the width w1 of the first metal layer 43, that is, about1 μm<w1−w2<4 μm. Each side portion of the second metal layer 45preferably has a width larger than about 0.5 μm and less than about 2μm. That is, the two side portions of the second metal layer 45 coveredwith the photoresist 47 are preferably etched to have substantially thesame width as each other. The lateral surfaces of the second metal layer45 are preferably etched to have a substantially rectangular or inclinedshape.

Referring to FIG. 4C, the first metal layer 43 is patterned via dryetching having anisotropic etching characteristic such as reactive ionetching (hereinafter, referred to as RIE) by using the photoresist 47 asa mask. When etching the first metal layer 43 other than the portion ofthe layer 43 covered with the photoresist 47, the first metal layer 43preferably has the same width w1 of the photoresist 47. Thus, patterningof the first and second metal layers 43, 45, respectively, only requirestwo etching steps and does not require baking of the photoresist beforeeach step of etching. Also, the relation between the first and secondmetal layers 43 and 45 also may be represented by about 1 μm<w1−w2<4 μm.

The first and second metal layers 43 and 45 resulting form the singlephotoresist step process described above form a gate 49 having adouble-layered metal structure. The gate 49 has the second metal layer45 positioned substantially in the middle of the first metal layer 43 sothat the each side portion of the first metal layer 43 having no secondmetal layer 45 thereon is wider than about 0.5 μm but narrower thanabout 2 μm. The photoresist 47 remaining on the second metal layer 45 isremoved after the two etching steps are completed.

Referring to FIG. 4D, a first insulating layer 51 is formed bydepositing a single layer or double layers of silicon oxide SiO₂ orsilicon nitride Si₃N₄ on the gate 49 and substrate 41 by CVD. Becauseeach side portion of the first metal layer 43 having no second metallayer 45 thereon is wider than 0.5 μm, double step differences formedbetween the substrate and gate can prevent the coverage of the firstinsulating layer 51 from being deteriorated as in prior art devices. Thehillock in the first metal layer 43 is also avoidable because a width ofa portion of the first metal layer 43 which is exposed is less thanabout 2 μm.

Amorphous silicon which is undoped and heavily doped amorphous siliconare sequentially deposited on the first insulating layer 41 by CVD, thusforming semiconductor and ohmic contact layers 53 and 55. The ohmiccontact and semiconductor layers 55 and 53 are patterned by means ofphotolithography to expose the first insulating layer 51.

Referring to FIG. 4E, conductive metal such as Al or Cr is laminated onthe insulating and ohmic contact layers 51 and 55 and patterned byphotolithography to form source and drain electrodes 57 and 59. Theohmic contact layer 55 exposed between the source and drain electrodes57 and 59 is etched by using the source drain electrodes 57 and 59 asmasks.

Referring to FIG. 4F, a second insulating layer 61 is formed bydepositing insulating material such as silicon oxide or silicon nitrideby CVD on the entire surface of the above structure. The secondinsulating layer is removed by photolithography to expose a designatedportion of the drain electrode 59 and thus form a contact hole 63. Oncetransparent and conductive material such as ITO (Indium Tin Oxide) orTin oxide SnO₂ is deposited on the second insulating layer 61 viasputtering and patterned by photolithography, a pixel electrode 65 isformed so that it is electrically connected to the drain electrode 59through the contact hole 63.

In another preferred embodiment of the present invention, the first andsecond metal layers 43 and 45 are first etched by means of a dry etchinghaving anisotropic etching characteristic such as RIE by using thephotoresist 47 as a mask. The gate 49 is formed by etching the secondmetal layer 45 under the photoresist 47 with an etching solutionprepared with a mixture of phosphoric acid H₃PO₄, acetic acid CH₃COOHand nitric acid HNO₃.

In still another preferred embodiment of the present invention, the gate49 is formed through a single etching step process for etching the firstand second metal layers 43 and 45 simultaneously and via a singleetching step, where the second metal layer 45 is etched more quicklythan the first metal layer 43 with an etching solution prepared with amixture of phosphoric acid H₃PO₄, acetic acid CH₃COOH and nitric acidHNO₃. Because of the etching material and metals used for the first andsecond metal layers of the gate, only a single etching step is required.Despite the fact that a single etching step is used, it is stillpossible to obtain the relationship between the widths w1 and w2 of thefirst and second metal layers described above. In this process, thefirst and second metal layers forming the gate 49 are formed andpatterned with a single photo resist step as described above and asingle etching step.

As described above, in the preferred embodiments of the presentinvention, the first and second metal layers are sequentially depositedon the substrate without performing a masking step between the step ofdepositing the first metal layer and the second metal layer, followed byforming a photoresist that covers a designated portion of the secondmetal layer. In one preferred embodiment, the second metal layer is wetetched by using the photoresist as a mask but the first metal layer isdry etched. As a result, the double-metal gate is formed. In anotherpreferred embodiment, a single etching step is used to form thedouble-metal gate wherein both the first metal layer and the secondmetal layer are wet etched, but the difference in etching rates of thefirst and second metal layers produces different etching affects whichresult in the desired double-step structure.

While the invention has been particularly shown and described withreference to preferred embodiments thereof, it will be understood bythose skilled in the art that the foregoing and other changes in formand details may be made therein without departing from the spirit andscope of the invention.

What is claimed is:
 1. A method of making a thin-film transistor,comprising the steps of: depositing a first metal layer on a substrate;depositing a second metal layer on the first metal layer without forminga photoresist on the first metal layer beforehand; forming a photoresisthaving a predetermined width on the second metal layer; anisotropicallyetching the first and second metal layers so such that the first metallayer and the second metal layer have the same width of the photoresistby using the photoresist as a mask, isotropically etching the secondmetal layer such that the second metal layer is narrower than the firstmetal layer by about 1 μm to about 4 μm by using the photoresist as amask, thus forming a gate having a double-layered structure includingthe first and second metal layers; and removing the photoresist.
 2. Themethod of making a thin-film transistor as claimed in claim 1, furthercomprising the steps of: forming a first insulating layer on thesubstrate including the gate; forming a semiconductor layer and an ohmiccontact layer on a portion of the first insulating layer at a locationcorresponding to the gate; forming a source electrode and drainelectrode extending onto the first insulating layer on two sides of theohmic contact layer, and removing a portion of the ohmic contact layerexposed between the source and drain electrodes; and forming a secondinsulating layer covering the semiconductor layer, the source electrode,the drain electrode and the first insulating layer.
 3. The method ofmaking a thin-film transistor as claimed in claim 1, wherein the firstmetal layer includes Al, Cu, or Au.
 4. The method of making a thin-filmtransistor as claimed in claim 1, wherein the second metal layerincludes Mo, Ta, or Co.
 5. The method of making a thin-film transistoras claimed in claim 1, wherein the first and second metal layers areremoved via a dry etching method.
 6. The method of making a thin-filmtransistor as claimed in claim 1, wherein the second metal layer isetched with an etching solution prepared with a mixture of phosphoricacid, acetic acid and nitric acid.
 7. A method of forming a thin filmtransistor comprising: forming a first metal layer on a substrate,forming a second metal layer on the first metal layer; simultaneouslypatterning the first and second metal layers to form a double-layeredmetal gate, so that a total width of the first metal layer is greaterthan a total width of the second metal layer by about 1 to 4 μm.
 8. Themethod of claim 7, wherein the first and second metal layers arepatterned so that the first metal layer has a first and a second sideportion being exposed from the second metal layer, each side portionbeing at least about 0.5 μm in width.
 9. The method of claim 8, whereineach side portion of the first metal layer is exposed so that each sideportion is less than about 2 μm in width.
 10. The method of claim 7,wherein the patterning step is such that the second metal layer isetched faster than the first etching layer.
 11. The method of claim 10,A method of forming a thin film transistor comprising: forming a firstmetal layer on a substrate, forming a second metal layer on the firstmetal layer; simultaneously patterning the first and second metal layersto form a double-layered metal gate, so that a total width of the firstmetal layer is greater than a total width of the second metal layer byabout 1 to 4 μm, wherein: the patterning step is such that the secondmetal layer is etched faster than the first etching layer; and thesecond metal layer is wet etched, and the first metal layer is dryetched.
 12. The method of claim 10, wherein both the first and secondmetal layers are wet etched.
 13. The method of claim 7, A method offorming a thin film transistor comprising: forming a first metal layeron a substrate; forming a second metal layer on the first metal layer;simultaneously patterning the first and second metal layers to form adouble-layered metal gate, so that a total width of the first metallayer is greater than a total width of the second metal layer by about 1to 4 μm, wherein the patterning step comprises: isotropically etchingthe second metal layer; and anisotropically etching the first metallayer.
 14. The method of claim 7, wherein no masking step is requiredbetween the formation of the first and second metal layers.
 15. Themethod of claim 7, A method of forming a thin film transistorcomprising: forming a first metal layer on a substrate, forming a secondmetal layer on the first metal layer; simultaneously patterning thefirst and second metal layers to form a double-layered metal gate, sothat a total width of the first metal layer is greater than a totalwidth of the second metal layer by about 1 to 4 μm, wherein thepatterning step does not require processing of a photoresist beforeetching.
 16. A method of waking a thin-film transistor, comprising thesteps of: depositing a first metal layer on a substrate, the first metallayer including aluminum; depositing a second metal layer on the firstmetal layer without forming a photoresist on the first metal layerbeforehand; forming a single photoresist having predetermined width onthe second metal layer; patterning the first and second metal layerssimultaneously in a single etching step using the single photoresist asa mask, the first metal layer being etched to have a width greater thana width of the second metal layer by about 1 to 4 μm; and removing thephotoresist.
 17. The method of making a thin film transistor as claimedin claim 16, further comprising the steps of: forming a first insulatinglayer on the substrate including the gate; forming a semiconductor layerand an ohmic contact layer on a portion of the first insulating layer ata location corresponding to the gate; forming a source electrode and adrain electrode extending onto the first insulating layer on two sidesof the ohmic contact layer, and removing a portion of the ohmic contactlayer exposed between the source and the drain electrodes; and forming asecond insulating layer covering the semiconductor layer, the sourceelectrode, the drain electrode and the first insulating layer.
 18. Themethod of making a thin film transistor as claimed in claim 16, whereinthe first and second metal layers are sequentially deposited viasputtering or a chemical vapor deposition method without breaking avacuum state.
 19. The method of making a thin film transistor as claimedin claim 16, wherein the first metal layer has thickness of about 500 Åto about 4000 Å.
 20. The method of making a thin film transistor asclaimed in claim 16, wherein the second metal layer includes Mo, Ta orCo.
 21. The method of making a thin film transistor as claimed in claim16, A method of making a thin-film transistor, comprising the steps of:depositing a first metal layer on a substrate, the first metal layerincluding aluminum, wherein the first metal layer has a thickness ofabout 500 Å to about 2000 Å; depositing a second metal layer on thefirst metal layer without forming a photoresist on the first metal layerbeforehand; forming a single photoresist having predetermined width onthe second metal layer; patterning the first and second metal layerssimultaneously in a single etching step using the single photoresist asa mask, the first metal layer being etched to have a width greater thana width of the second metal layer by about 1 to 4 μm; and removing thephotoresist.
 22. The method of making a thin film transistor as claimedin claim 16, wherein two side portions of the first metal layer havingno second metal layer deposited thereon have substantially the samewidth as each other.
 23. A method of forming a thin film transistorcomprising: forming a first metal layer on a substrate, forming a secondmetal layer on the first metal layer, wherein no masking step isrequired between the formation of the first and second metal layers; andsimultaneously patterning the first and second metal layers to form adouble-layered metal gate, so that the first metal layer has asubstantially trapezoidal cross-sectional area with a top edge that issubstantially parallel to the substrate, wherein: the patterning step issuch that the second metal layer is etched faster than the first metallayer; the second metal layer is wet etched, and the first metal layeris dry etched; a first portion of the top edge is in contact with thesecond metal layer; a second portion of the top edge is not in contactwith the second metal layer; and a total width of the first metal layeris greater than a total width of the second metal layer by about 1 to 4μm.
 24. A method of forming a thin film transistor comprising: forming afirst metal layer on a substrate, forming a second metal layer on thefirst metal layer, wherein no masking step is required between theformation of the first and second metal layers; and simultaneouslypatterning the first and second metal layers to form a double-layeredmetal gate, so that the first metal layer has a substantiallytrapezoidal cross-sectional area with a top edge that is substantiallyparallel to the substrate, wherein: the patterning step comprises:isotropically etching the second metal layer; and anisotropicallyetching the first metal layer; a first portion of the top edge is incontact with the second metal layer; a second portion of the top edge isnot in contact with the second metal layer; and a total width of thefirst metal layer is greater than a total width of the second metallayer by about 1 to 4 μm.
 25. A method of forming a thin film transistorcomprising: forming a first metal layer on a substrate, forming a secondmetal layer on the first metal layer, wherein no masking step isrequired between the formation of the first and second metal layers; andsimultaneously patterning the first and second metal layers to form adouble-layered metal gate, so that the first metal layer has asubstantially trapezoidal cross-sectional area with a top edge that issubstantially parallel to the substrate, wherein: the patterning stepdoes not require processing of a photoresist before etching; a firstportion of the top edge is in contact with the second metal layer; asecond portion of the top edge is not in contact with the second metallayer; and a total width of the first metal layer is greater than atotal width of the second metal layer by about 1 to 4 μm.
 26. A methodof forming a thin film transistor comprising: forming a first metallayer on a substrate, forming a second metal layer on the first metallayer, wherein no masking step is required between the formation of thefirst and second metal layers; and simultaneously patterning the firstand second metal layers to form a double-layered metal gate, so that thefirst metal layer has a substantially trapezoidal cross-sectional areawith a top edge that is substantially parallel to the substrate,wherein: a first portion of the top edge is in contact with the secondmetal layer; a second portion of the top edge is not in contact with thesecond metal layer; lateral surfaces of the second metal layer have asubstantially rectangular shape; and a total width of the first metallayer is greater than a total width of the second metal layer by about 1to 4 μm.
 27. A method of forming a thin film transistor comprising:forming a first metal layer on a substrate, forming a second metal layeron the first metal layer, wherein no masking step is required betweenthe formation of the first and second metal layers; and simultaneouslypatterning the first and second metal layers to form a double-layeredmetal gate, so that the first metal layer has a substantiallytrapezoidal cross-sectional area with a top edge that is substantiallyparallel to the substrate, wherein: a first portion of the top edge isin contact with the second metal layer; a second portion of the top edgeis not in contact with the second metal layer; lateral surfaces of thesecond metal layer are flat so that the second metal layer has asubstantially rectangular cross-sectional area; and a total width of thefirst metal layer is greater than a total width of the second metallayer by about 1 to 4 μm.
 28. A method of forming a thin film transistorcomprising: forming a first metal layer on a substrate, forming a secondmetal layer on the first metal layer, wherein no masking step isrequired between the formation of the first and second metal layers; andsimultaneously patterning the first and second metal layers to form adouble-layered metal gate, so that the first metal layer has asubstantially trapezoidal cross-sectional area with a top edge that issubstantially parallel to the substrate, wherein: a first portion of thetop edge is in contact with the second metal layer; a second portion ofthe top edge is not in contact with the second metal layer; lateralsurfaces of the second metal layer are inclined so that the second metallayer has a substantially trapezoidal cross-sectional area; and a totalwidth of the first metal layer is greater than a total width of thesecond metal layer by about 1 to 4 μm.
 29. A method of forming a thinfilm transistor comprising: forming a first metal layer on a substrate,forming a second metal layer on the first metal layer, wherein nomasking step is required between the formation of the first and secondmetal layers; and simultaneously patterning the first and second metallayers to form a double-layered metal gate, so that the first metallayer has a substantially trapezoidal cross-sectional area with a topedge that is substantially parallel to the substrate, wherein: a firstportion of the top edge is in contact with the second metal layer; asecond portion of the top edge is not in contact with the second metallayer; a total width of the first metal layer is greater than a totalwidth of the second metal layer by about 1 to 4 μm; and the width of thefirst metal layer is measured along the top edge of the first metallayer that is substantially parallel to the substrate.
 30. A method offorming a thin film transistor comprising: forming a first metal layeron a substrate, forming a second metal layer on the first metal layer,wherein no masking step is required between the formation of the firstand second metal layers; and simultaneously patterning the first andsecond metal layers to form a double-layered metal gate, so that thefirst metal layer has a substantially trapezoidal cross-sectional areawith a top edge that is substantially parallel to the substrate,wherein: a first portion of the top edge is in contact with the secondmetal layer; a second portion of the top edge is not in contact with thesecond metal layer; a total width of the first metal layer is greaterthan a total width of the second metal layer by about 1 to 4 μm; and thewidth of the second metal layer is measured along a top edge of thesecond metal layer that is substantially parallel to the substrate. 31.A method of making a thin-film transistor, comprising the steps of:depositing a first metal layer on a substrate, the first metal layerincluding aluminum; depositing a second metal layer on the first metallayer without forming a photoresist on the first metal layer beforehand,wherein the first and second metal layers are sequentially deposited viasputtering or a chemical vapor deposition method without breaking avacuum state; forming a single photoresist having predetermined width onthe second metal layer; and patterning the first and second metal layerssimultaneously in a single etching step using the single photoresist asa mask, so that the first metal layer has a substantially trapezoidalcross-sectional area with a top edge that is substantially parallel tothe substrate, wherein: a first portion of the top edge is in contactwith the second metal layer; a second portion of the top edge is not incontact with the second metal layer; and the first metal layer is etchedto have a width greater than a width of the second metal layer by about1 to 4 μm; and removing the photoresist.
 32. The method of making a thinfilm transistor as claimed in claim 31, further comprising the steps of:forming a first insulating layer on the substrate including the gate;forming a semiconductor layer and an ohmic contact layer on a portion ofthe first insulating layer at a location corresponding to the gate;forming a source electrode and a drain electrode extending onto thefirst insulating layer on two sides of the ohmic contact layer, andremoving a portion of the ohmic contact layer exposed between the sourceand the drain electrodes; and forming a second insulating layer coveringthe semiconductor layer, the source electrode, the drain electrode andthe first insulating layer.
 33. The method of making a thin filmtransistor as claimed in claim 31, wherein the first metal layer hasthickness of about 500 Å to about 4000 Å.
 34. The method of making athin film transistor as claimed in claim 31, wherein the second metallayer includes Mo, Ta or Co.
 35. The method of making a thin filmtransistor as claimed in claim 31, wherein the first metal layer has athickness of about 500 Å to about 2000 Å.
 36. The method of making athin film transistor as claimed in claim 31, wherein two side portionsof the first metal layer having no second metal layer deposited thereonhave substantially the same width as each other.
 37. The method ofmaking a thin film transistor as claimed in claim 31, wherein lateralsurfaces of the second metal layer have a substantially rectangularshape.
 38. The method of making a thin film transistor as claimed inclaim 31, wherein lateral surfaces of the second metal layer are flat sothat the second metal layer has a substantially rectangularcross-sectional area.
 39. The method of making a thin film transistor asclaimed in claim 31, wherein lateral surfaces of the second metal layerare inclined so that the second metal layer has a substantiallytrapezoidal cross-sectional area.
 40. The method of making a thin filmtransistor as claimed in claim 31, wherein the width of the first metallayer is measured along the top edge of the first metal layer that issubstantially parallel to the substrate.
 41. The method of making a thinfilm transistor as claimed in claim 31, wherein the width of the secondmetal layer is measured along a top edge of the second metal layer thatis substantially parallel to the substrate.
 42. A method of making athin-film transistor, comprising the steps of: depositing a first metallayer on a substrate, the first metal layer including aluminum;depositing a second metal layer on the first metal layer without forminga photoresist on the first metal layer beforehand; forming a singlephotoresist having predetermined width on the second metal layer;patterning the first and second metal layers simultaneously in a singleetching step using the single photoresist as a mask, so that the firstmetal layer has a substantially trapezoidal cross-sectional area with atop edge that is substantially parallel to the substrate, wherein: afirst portion of the top edge is in contact with the second metal layer;a second portion of the top edge is not in contact with the second metallayer; and the first metal layer is etched to have a width greater thana width of the second metal layer by about 1 to 4 μm; removing thephotoresist; forming a first insulating layer on the substrate includingthe gate; forming a semiconductor layer and an ohmic contact layer on aportion of the first insulating layer at a location corresponding to thegate; forming a source electrode and a drain electrode extending ontothe first insulating layer on two sides of the ohmic contact layer, andremoving a portion of the ohmic contact layer exposed between the sourceand the drain electrodes; and forming a second insulating layer coveringthe semiconductor layer, the source electrode, the drain electrode andthe first insulating layer.
 43. A method of making a thin-filmtransistor, comprising the steps of: depositing a first metal layer on asubstrate, the first metal layer including aluminum, wherein the firstmetal layer has thickness of about 500 Å to about 4000 Å; depositing asecond metal layer on the first metal layer without forming aphotoresist on the first metal layer beforehand; forming a singlephotoresist having predetermined width on the second metal layer;patterning the first and second metal layers simultaneously in a singleetching step using the single photoresist as a mask, so that the firstmetal layer has a substantially trapezoidal cross-sectional area with atop edge that is substantially parallel to the substrate, wherein: afirst portion of the top edge is in contact with the second metal layer;a second portion of the top edge is not in contact with the second metallayer; and the first metal layer is etched to have a width greater thana width of the second metal layer by about 1 to 4 μm; and removing thephotoresist.
 44. A method of making a thin-film transistor, comprisingthe steps of: depositing a first metal layer on a substrate, the firstmetal layer including aluminum; depositing a second metal layer on thefirst metal layer without forming a photoresist on the first metal layerbeforehand, wherein the second metal layer includes Mo, Ta or Co;forming a single photoresist having predetermined width on the secondmetal layer; patterning the first and second metal layers simultaneouslyin a single etching step using the single photoresist as a mask, so thatthe first metal layer has a substantially trapezoidal cross-sectionalarea with a top edge that is substantially parallel to the substrate,wherein: a first portion of the top edge is in contact with the secondmetal layer; a second portion of the top edge is not in contact with thesecond metal layer; and the first metal layer is etched to have a widthgreater than a width of the second metal layer by about 1 to 4 μm; andremoving the photoresist.
 45. A method of making a thin-film transistor,comprising the steps of: depositing a first metal layer on a substrate,the first metal layer including aluminum; depositing a second metallayer on the first metal layer without forming a photoresist on thefirst metal layer beforehand; forming a single photoresist havingpredetermined width on the second metal layer; patterning the first andsecond metal layers simultaneously in a single etching step using thesingle photoresist as a mask, so that the first metal layer has asubstantially trapezoidal cross-sectional area with a top edge that issubstantially parallel to the substrate, two side portions of the firstmetal layer having no second metal layer deposited thereon havesubstantially the same width as each other, wherein: a first portion ofthe top edge is in contact with the second metal layer; a second portionof the top edge is not in contact with the second metal layer; and thefirst metal layer is etched to have a width greater than a width of thesecond metal layer by about 1 to 4 μm; and removing the photoresist.